Lasertec (6920) Faces Near-Term Order Slump but Holds Monopoly in EUV Inspection, Long-Term Upside Seen
English summary
Lasertec (6920) stock has fallen out of favor after its 11-year streak of record profits ended; the company forecasts revenue and profit declines for the fiscal year ending June 2026, with orders plunging 61.4% year-on-year. However, the slump reflects a pause in major customers' investment cycles rather than a loss of demand, and the company maintains an order backlog of over ¥300 billion. Lasertec holds a 100% global share in EUV mask blank inspection equipment, an essential step for advanced semiconductor production, and boasts an operating margin of around 50%. The next growth wave is expected as High-NA EUV lithography rolls out, driving large-scale inspection tool upgrades from 2027 onward. Near-term unpopularity may present a buying opportunity if quarterly order momentum recovers, no significant competitive threat emerges, and short-seller allegations are resolved.
Chinese summary
激光科技（6920）在连续11年创纪录的利润后失去市场人气，预计2026财年营收和利润将下滑，订单同比暴跌61.4%。但这一低迷反映了主要客户投资周期的暂停而非需求消失，公司仍持有超过3000亿日元的在手订单。激光科技在EUV光罩基底检测设备领域拥有全球100%份额，是先进半导体制造不可或缺的一环，营业利润率约50%。下一轮增长预计随高NA EUV光刻技术推广而来，2027年后检测设备大规模升级需求将启动。如果季度订单动能恢复、无重大竞争威胁且空头指控消散，当前的低迷反而可能构成中长期建仓机会。
Key points
Lasertec forecasts its first revenue and profit decline in 11 years for FY2026/6, with orders down 61.4% YoY, but still holds a backlog exceeding ¥300 billion.
激光科技预计2026财年将出现11年来首次营收和利润下滑，订单同比减少61.4%，但在手订单仍超过3000亿日元。
The company has a 100% global monopoly on EUV mask blank inspection equipment, serving as a critical toll collector for advanced chip manufacturing irrespective of which memory or foundry firm succeeds.
公司在EUV光罩基底检测设备领域拥有全球100%垄断份额，无论存储或代工企业谁胜出，其先进芯片制造均需通过该检测环节。
Operating profit margin is approximately 50%, among the highest in the semiconductor equipment sector.
营业利润率约50%，在半导体设备行业中名列前茅。
The next major growth catalyst is the transition to High-NA EUV lithography, expected to drive inspection-tool upgrades with capital spending gaining momentum from 2027.
下一个主要增长催化剂是高NA EUV光刻技术的过渡，预计将驱动检测设备升级，资本支出从2027年起加速。
Risks include the timing of quarterly order recovery, potential competitive entry from KLA in EUV inspection, and outstanding short-seller allegations that could undermine market confidence.
风险包括季度订单恢复时点、KLA等竞争对手可能进入EUV检测领域以及悬而未决的空头指控可能打击市场信心。